In order to avoid the use of expensive vacuum equipment and complicated discharge system,atmospheric-pressure plasma chemical vapor deposition (AP-PCVD),which attracted much attention recently,was employed.

Influence of discharge current on hot cathode plasma chemical vapor deposition of diamond films;

Effect of plasma chemical vapor deposition parameters on electron property in Ar plasma;

The relation between characteristics of hot cathode glow discharge and diamond film deposition techniques in hot cathode glow discharge plasma chemical vapor deposition process was discussed.

DEPOSITION THEORY OF THIN HARD PCVD COATINGS;

Si B N composite films had been prepared at proper processing parameters by RF PCVD.

SnO 2 Sb thin film is prepared with PCVD The film possesses better gas sensitivity When temperature rises, the response time maintains almost the same but the recovery time reduces and the sensibility gets higher When the temperature reaches 200℃ or more, the sensitivity maintains stable The difference between the sensibility of the resistors of different resistance is small (4 refs

Study on device of magneto-active PECVD;

Plasma enhanced chemical vapor deposition (PECVD) technique is the primary method which is used to prepare hydrogenated silicon film.

This review will describe the deposition methods, properties and some applications of DLC films by Plasma Enhanced Chemical Vapor Deposition.